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Ar-sputtered Pt/Co multilayers with large anisotropy energy and coercivity

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4 Author(s)
P. F. Carcia ; DuPont Central Res. & Dev., Wilmington, DE, USA ; M. Reilly ; Z. G. Li ; H. W. van Kesteren

We have discovered a process for Ar-sputtering Pt/Co multilayers, a candidate for high density magneto-optical recording medium, so that they have large anisotropy energy (Keff ~1.2×107 erg/cm3-Co) and large coercivity (Hc ~3.5 kOe) simultaneously. To achieve these improved properties the multilayers were sputtered on granular Pt underlayers, made by etching thin Pt layers, initially 20-40 Å thick. Plan-view transmission electron microscopy revealed that the microstructures of Pt/Co multilayers, grown on etched-Pt underlayers, was also granular with excellent (111)-fcc texture. Both Keff and Hc were optimized, when the (111)-fcc texture was a maximum

Published in:

IEEE Transactions on Magnetics  (Volume:30 ,  Issue: 6 )