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Stress, microstructure and materials reliability of sputter-deposited Fe-N films

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2 Author(s)
Narayan, P.B. ; Rocky Mountain Magnetics Inc., Louisville, CO, USA ; Kim, Y.K.

Sputtered Fe-N films with various nitrogen contents were investigated from point of view of device manufacturing. As-deposited Fe-N films have compressive stress that becomes tensile due to heat treatment. At optimum N content where soft magnetic properties were realized, the film shows a close to amorphous microstructure. Compared to NiFe, Fe-N has higher reactivity with humidity and lower reactivity with atmospheric pollutants such as Cl and S

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Magnetics, IEEE Transactions on  (Volume:30 ,  Issue: 6 )