Cart (Loading....) | Create Account
Close category search window

Fabrication of large area Si cylindrical drift detectors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Wei Chen ; Brookhaven Nat. Lab., Upton, NY, USA ; Kraner, H.W. ; Zheng Li ; Rehak, P.
more authors

The processing of an advanced silicon detector, a large area cylindrical drift detector (CDD), was carried out in the BNL Instrumentation Division Fabrication Facility. The double-sided planar process technique was developed for the fabrication of the CDD. Important improvements of the double-sided planar process in this fabrication include the introduction of an AI implantation protection mask and implantation of boron through an 1000 angstrom oxide layer in the step of opening the p-window. Another important aspect of the design of the CDD is the structure called “river,” which allows the current generated on the Si-SiO2 interface to “flow” into the guard anode, and thus minimize the leakage current at the signal anode. The test result showed that for the best detector most of the signal anodes have leakage currents of about 0.3 nA/cm2

Published in:

Nuclear Science, IEEE Transactions on  (Volume:41 ,  Issue: 4 )

Date of Publication:

Aug 1994

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.