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Fabrication and performance of high moment laminated FeAlN thin film inductive recording heads

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4 Author(s)
Wang, S. ; Data Storage Syst. Center, Carnegie Mellon Univ., Pittsburgh, PA, USA ; Liu, F. ; Maranowski, K.D. ; Kryder, M.H.

Experimental thin film inductive heads using previously developed laminated FeAlN high moment soft magnetic materials have been designed, and fabricated to the wafer level. The heads, with a gap length of 0.2 μm and trackwidths varying from 6 to 84 μm, were fabricated with a mainly dry process. The dynamic domain patterns of the top magnetic poles were observed with a high speed wide-field Kerr microscope. Closure domains were not present, while multiple easy-axis domains were observed in the head yokes. The head inductances were measured from 1 to 50 MHz with a network analyzer. The electrical and magnetic testing results show that the fabricated heads function well at the wafer level and that laminated FeAlN high moment material is a very promising candidate for future high-density recording head applications

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Magnetics, IEEE Transactions on  (Volume:30 ,  Issue: 2 )