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Application of the Child-Langmuir law to magnetron discharge plasmas

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2 Author(s)
Kuwahara, K. ; Dept. of Electr. Eng. & Comput. Sci., Nagasaki Univ., Japan ; Fujiyama, H.

In order to investigate the influence of magnetic field on magnetron plasmas, the dependence of discharge-current density (Jd ) on magnetic flux densities (B) perpendicular to the electric field over the whole discharge space in a magnetron apparatus with flat multi-targets has been studied. The dependencies on working gas pressures (P) and voltages (V) have been also studied in the configuration. From the experimental results, it was found that Jd was approximately proportional to B2, P2 and V3/2. The sheath structure in the apparatus has been investigated as a function of B by both a probe method and a spectroscopic one. The cathode-fall thickness was roughly proportional to B-1. From a numerical analysis on kinetics of γ electrons emitted from the cathode surface, it was found that the dependence of Jd on B could be explained by the Child-Langmuir law, in which the sheath thickness was replaced by the equivalent electron Larmor radius

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Plasma Science, IEEE Transactions on  (Volume:22 ,  Issue: 4 )