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Modeling of a sputter reactor using the direct simulation Monte Carlo method

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5 Author(s)
A. Kersch ; Corp. Res. & Dev., Siemens AG, Munich, Germany ; W. Morokoff ; C. Werner ; D. Restaino
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The direct simulation Monte Carlo method is utilized to simulate the particle and energy distributions in a state of the art sputtering reactor used to deposit titanium films in small contact holes. The calculations provide information about particle and temperature distributions within the reactor, deposition rate profiles, and angular distributions of the atoms arriving at the substrate. The results agree quite well with experimental data.<>

Published in:

Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International

Date of Conference:

13-16 Dec. 1992