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A new vector 2D photolithography simulation tool

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2 Author(s)
Lucas, K. ; Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA ; Strojwas, A.J.

A new vector optical lithography simulator, METROPOLE, is presented. Rigorous simulations run quickly on a workstation for complex 2D regular and phase shifting masks, substrate bleaching, optical metrology and alignment problems. An analysis of a novel phase shifting techniques is undertaken to highlight the usefulness of the program.<>

Published in:

Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International

Date of Conference:

13-16 Dec. 1992