Referenced Items are not available for this document.
A new vector optical lithography simulator, METROPOLE, is presented. Rigorous simulations run quickly on a workstation for complex 2D regular and phase shifting masks, substrate bleaching, optical metrology and alignment problems. An analysis of a novel phase shifting techniques is undertaken to highlight the usefulness of the program.<
Published in:
Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International
Date of Conference: 13-16 Dec. 1992
- Page(s):
- 177 - 180
- Meeting Date :
- 13 Dec 1992-16 Dec 1992
- ISSN :
- 0163-1918
- Print ISBN:
- 0-7803-0817-4
- INSPEC Accession Number:
- 4730548
- Conference Location :
- San Francisco, CA, USA
- Digital Object Identifier :
- 10.1109/IEDM.1992.307336
- Product Type:
- Conference Publications
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