Referenced Items are not available for this document.
New lithography techniques for electrode widths of less than 60 nm are proposed. The electrodes are fabricated by using extremely thin anodic oxidation films (AOFs) as resists. 60 nm-wide electrodes were obtained by using a wet etching technique and 100 nm-wide electrodes by using a dry etching-technique. The experimental results of a 10 GHz surface acoustic wave filter with an insertion loss of 15 dB are also presented for an 80 nm-wide electrode
Published in:
Electronics Letters
(Volume:30
,
Issue:
12
)
Date of Publication: 9 Jun 1994
- Page(s):
- 1010 - 1011
- ISSN :
- 0013-5194
- INSPEC Accession Number:
- 4722174
- Digital Object Identifier :
- 10.1049/el:19940631
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 06 August 2002
- Issue Date :
- 9 Jun 1994
- Sponsored by :
- Institution of Engineering and Technology
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