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Silicon nitride thin-film deposition by LPCVD with in situ HF vapor cleaning and its application to stacked DRAM capacitor fabrication

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3 Author(s)
Ino, M. ; VLSI R&D Center, Oki Electr. Ind. Co. Ltd., Tokyo, Japan ; Inoue, N. ; Yoshimaru, M.

Silicon nitride film deposited by LPCVD with newly developed in situ HF vapor cleaning has been studied and applied to fabricate dielectric films for stacked DRAM capacitors. Using this method, an oxide-free surface of underlaid poly-Si can be obtained. Silicon nitride film deposited on this surface has been verified by FTIR measurement to have the stoichiometrically proper composition of Si3N4 . However, the film was found to be selectively deposited on poly-Si electrodes. This selective deposition degrades the reliability of the stacked capacitor, because the silicon nitride can not completely cover the periphery of poly-Si electrodes on SiO2. We propose a simple process that avoids the problem making it possible to apply silicon nitride film to stacked-capacitor fabrication. Stacked capacitors fabricated by this process exhibit very low leakage current and high electrical reliability even for ultra-thin silicon nitride films less than 5 nm thick

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Electron Devices, IEEE Transactions on  (Volume:41 ,  Issue: 5 )