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Simple technologies for fabrication of low-loss silica waveguides

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5 Author(s)
Lai, Q. ; Inst. of Quantum Electron., Swiss Federal Inst. of Technol. Zurich, Switzerland ; Gu, J.S. ; Smit, M.K. ; Schmid, J.
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A simple and reproducible technology is developed for the fabrication of low-loss silica waveguides on silicon substrates. The guiding layer is formed by changing the Si-O ratio composition of the SiO2 layer. The waveguides can be made to have a good match to either optical fibres or guided-wave devices in III-V compound semiconductors.

Published in:

Electronics Letters  (Volume:28 ,  Issue: 11 )