Referenced Items are not available for this document.
The author reviews silicon epitaxial equipment and processing advances that have contributed to epitaxial base bipolar technology. He addresses equipment design and surface cleaning requirements for a manufacturable low-temperature epitaxial process. Single-wafer and batch multiwafer equipment designs and processing, as well as possible clustered configurations for improved process capabilities, are discussed
Published in:
Bipolar/BiCMOS Circuits and Technology Meeting, 1992., Proceedings of the 1992
Date of Conference: 7-8 Oct 1992
- Page(s):
- 16 - 22
- Meeting Date :
- 07 Oct 1992-08 Oct 1992
- Print ISBN:
- 0-7803-0727-5
- INSPEC Accession Number:
- 4575375
- Conference Location :
- Minneapolis, MN
- Digital Object Identifier :
- 10.1109/BIPOL.1992.274091
- Product Type:
- Conference Publications
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