Cart (Loading....) | Create Account
Close category search window
 

Charge trapping and transport properties of SIMOX buried oxides with a supplemental oxygen implant

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Boesch, H.E., Jr. ; US Army Res. Lab., Adelphi, MD, USA ; Taylor, T.L. ; Krull, W.A.

The radiation response characteristics of single-and multiple-implant SIMOX (separation by implantation of oxygen) buried oxide layers that had received a supplemental oxygen implant and anneal step were measured as a function of temperature and time after exposure to short radiation pulses. A fast capacitance-voltage technique was used for these measurements. The results indicate that, in comparison to standard SIMOX, the supplemental-implant SIMOX buried oxide shows hole motion through the oxide, greatly reduced bulk hole trapping, and little or no bulk shallow electron trapping. Substantial interfacial hole trapping was observed in these materials, as well as deep electron trapping in the single-implant material

Published in:

Nuclear Science, IEEE Transactions on  (Volume:40 ,  Issue: 6 )

Date of Publication:

Dec 1993

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.