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In situ particle monitoring in a single wafer poly silicon and silicon nitride etch system

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7 Author(s)
B. Busselman ; Texas Instrum., SEMATECH, Dallas, TX, USA ; T. Emery ; K. Staker ; K. Heiman
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An in situ particle monitor has been installed in a single wafer polysilicon and silicon nitride etch system. Particle data collected during etching and wafer transport operations has been correlated to functional yield, short loop monitors and patterned wafer visual inspections. Based on these correlations, significant cost reductions are predicted.

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Semiconductor Manufacturing Science Symposium, 1993. ISMSS 1993., IEEE/SEMI International

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