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Modeling oxide thickness dependence of charging damage by plasma processing

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3 Author(s)
Hyungcheol Shin ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Noguchi, K. ; Chenming Hu

Develops a quantitative model for thin oxide plasma charging damage by examining the oxide thickness dependence of charging current. The current is deduced from capacitance-voltage (CV) curves of metal-oxide-semiconductor (MOS) capacitors after plasma etch. The model predicts the oxide thickness dependence of plasma charging successfully. It is shown that plasma acting on a very thin oxide during processing may be modeled as essentially a current source. Thus the damage will not be greatly exacerbated as oxide thickness is further reduced in the future. Gate oxide breakdown voltage distribution of MOS capacitors after plasma processing can be predicted accurately from that of a control wafer by using a defect-induced breakdown model.<>

Published in:

Electron Device Letters, IEEE  (Volume:14 ,  Issue: 11 )