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Intrinsic stress in DC sputtered niobium

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3 Author(s)
Booi, P.A.A. ; Nat. Inst. of Stand. & Technol., Boulder, CO, USA ; Livingston, C.A. ; Benz, S.P.

The intrinsic mechanical stress of DC-magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point is always characterized by the same cathode-current-Ar-pressure relationship.<>

Published in:

Applied Superconductivity, IEEE Transactions on  (Volume:3 ,  Issue: 2 )