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Progress toward host tool integration of in situ particle monitors

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2 Author(s)
Borden, P.G. ; High Yield Technol., Sunnyvale, CA, USA ; Burghard, R.

The authors point out that in situ particle monitoring has gained substantial acceptance as a manufacturing process control technique, with the capability of providing automated 100% inspection during process. This is significant for several reasons, including faster detection of out of control events and higher baseline count rates as a consequence of the ability to monitor continuously, the detection of process- and intertool-related particle sources as a consequence of the ability to monitor during process, and an increase in availability as a consequence of the ability to automate particle tests. To fully achieve these benefits, the in situ monitor must be integrated into the host tool, something that can be done by either the end user or the tool supplier. Progress toward host integration in VLSI process tools is discussed

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992

Date of Conference:

30 Sep-1 Oct 1992

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