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Application of feed-forward and feedback control to a photolithography sequence

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2 Author(s)
S. Leang ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; C. J. Spanos

Describe the implementation of supervisory control of three photolithography machines: a spincoat and bake track, a stepper and a developer. The objective of the experiment was to improve the reproducibility of critical dimensions of photoresist patterns. The results showed that the supervisory controller is capable of bringing the lithography process back to its previous specifications, even after all three machines have been taken down for maintenance and repairs

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992

Date of Conference:

30 Sep-1 Oct 1992