Cart (Loading....) | Create Account
Close category search window
 

SCOPE-a s_imultaneous c_o_ntact and p_lanarization e_tch process for low-cost high-performance CMOS applications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Young, K.K. ; Hewlett Packard Co., Palo Alto, CA, USA ; Uesato, W. ; Hu, H.K. ; Riley, P.E.
more authors

As CMOS device geometries shrink to below half micron sizes, contact and metal design rules have become the limiting factors for increasing circuit packing density. In order to reduce the contact and metal features accordingly, the process integration issues such as reduced thermal budget, minimized contact size, minimized contact enclosure, dielectric surface planarity, and metal step coverage in the contact must be investigated. In this work, a novel approach is employed to etch contacts and planarize the dielectric in one step. The technique is called SCOPE for Simultaneous COntact and Planarization Etch. The SCOPE process eliminate the need for oxide reflow, thereby minimizing the thermal budget after source/drain formation. It also avoids the need for extensive overetch due to the uniform contact depth, thereby allowing the misaligned contact edges on field oxides

Published in:

VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on

Date of Conference:

22-24 May 1991

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.