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An integrated technology CAD environment

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9 Author(s)
Fasching, F. ; Inst. for Microelectron., Tech. Univ. of Vienna, Austria ; Fischer, C. ; Halama, S. ; Pimingstorfer, H.
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A new TCAD system is presented, capable of performing complex development tasks by means of a powerful interaction language and an efficient database system. The integration of tools is supported through a comfortable layered application program interface

Published in:

VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on

Date of Conference:

22-24 May 1991