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X-ray lithography-an overview

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2 Author(s)
Peckerar, Martin C. ; US Naval Res. Lab., Washington, DC, USA ; Maldonado, Juan R.

The fundamentals of X-ray lithography are reviewed. Issues associated with resolution, wafer throughput, and process latitude are discussed. X-ray lithography is compared with other lithographic technologies; future advancements, such as X-ray projection lithography, are described. It is shown that the major barrier to the near-term success for X-ray lithography is the requirement for a defect-free one-to-one mask which satisfies the stringent image-placement needs of submicrometer patterning

Published in:

Proceedings of the IEEE  (Volume:81 ,  Issue: 9 )

Date of Publication:

Sep 1993

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