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Improved structure for optimisation of focus and exposure for IC production

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5 Author(s)
Walton, A.J. ; Dept. of Electr. Eng., Edinburgh Univ., UK ; Fallon, M. ; Stevenson, J.T.M. ; Ross, A.W.S.
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A test structure that can be used for optimising the focus and exposure of wafer steppers is presented. It consists of a single layer of polysilicon which lends itself to automatic electrical measurement and does not suffer from the apex height reduction which occurs with the previously reported Gaudi structure.<>

Published in:

Electronics Letters  (Volume:29 ,  Issue: 17 )