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In-situ film thickness and temperature monitoring using a 2 GHz acoustic phase measurement system

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5 Author(s)

A 2 GHz acoustic phase measurement system has been developed and used for in-situ monitoring of thin film thickness and temperature in silicon wafer processing. Initial evaporation experiments in a vacuum station have shown a film thickness resolution of ~1000 Å with a potential resolution to ~1 Å. The potential of this system for making temperature measurements has also been explored, and initial experiments in an oven have shown a temperature resolution of 0.01 K

Published in:

Ultrasonics Symposium, 1991. Proceedings., IEEE 1991

Date of Conference:

8-11 Dec 1991