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Damage-less dry etching of YBaCuO films under liquid nitrogen cooling (striplines)

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3 Author(s)
Akoh, H. ; Electrotechnical Lab., Ibaraki, Japan ; Sato, H. ; Takada, S.

A novel dry etching process has been developed to reduce etching damage for striplines of YBaCuO thin films in which samples are cooled by liquid nitrogen. The patterned striplines have widths ranging from 2 to 100 mu m and a length of 1 mm. The critical current density J/sub c/ at 77 K for striplines of

Published in:

Applied Superconductivity, IEEE Transactions on  (Volume:3 ,  Issue: 1 )