Referenced Items are not available for this document.
A singlemode optical waveguide has been developed with a high refractive index difference Delta of 2% and low loss of 0.12 dB/cm at 1.3 mu m wavelength. This waveguide consists of buffer layer, core ridge, and cladding layer of SiOxNyHz formed by the plasma CVD method at a low temperature of 270 degrees C. The absorption loss which is affected by the OH ion content at 1.39 mu m wavelength can be decreased by annealing at 500 degrees C under N2 atmosphere. The low temperature fabrication process is effectively used for the monolithic integration of photonic/electronic circuits.
Published in:
Electronics Letters
(Volume:29
,
Issue:
12
)
Date of Publication: 10 June 1993
- Page(s):
- 1123 - 1124
- ISSN :
- 0013-5194
- INSPEC Accession Number:
- 4447360
- Digital Object Identifier :
- 10.1049/el:19930749
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 06 August 2002
- Issue Date :
- 10 June 1993
- Sponsored by :
- Institution of Engineering and Technology
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