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Sensor fusion for ULSI manufacturing process control

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5 Author(s)
Moslehi, M.M. ; Texas Instruments, Dallas, TX, USA ; Velo, L. ; Najm, H. ; Breedijk, T.
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An integrated sensor system for conductive layer deposition process control is presented. The process equipment employs a multizone illuminator and noninvasive sensors for dynamic process uniformity control, real-time process and end-pointing, and process diagnosis. Various modes of sensor fusion have been implemented for improved equipment/process performance. Several noninvasive in situ sensors developed and integrated in a rapid thermal chemical-vapor-deposition (CVD) system for CVD tungsten (CVD-W) process control and diagnosis are presented.<>

Published in:

VLSI Technology, 1992. Digest of Technical Papers. 1992 Symposium on

Date of Conference:

2-4 June 1992