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Mossbauer effect study of ordering in Fe-Al-Si and Fe-Al-Si-Ni magnetic thin films

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4 Author(s)
Miyazaki, Masahiro ; Dept. of Chem., Nagaoka Univ. of Technol., Niigata, Japan ; Ichikawa, Masashi ; Komatsu, Takayuki ; Matusita, Kazumasa

Fe-Al-Si and Fe-Al-Si-Ni magnetic films with a thickness of 1 μm were deposited on crystallized-glass substrates by RF planar magnetron sputtering, and the changes in magnetic properties and microscopic structural changes in the films due to annealing were investigated. The films annealed at 500°C exhibited excellent soft magnetic properties for recording head materials. Fe-Al-Si-Ni films with high saturation magnetic-flux densities of 14.8 kG were obtained. Conversion electron Mossbauer spectroscopy showed that the disordered structure of α-type in as-sputtered films transformed into the ordered structure consisting of a mixture of B2- and DO3-types at a temperature of 500°C

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Magnetics, IEEE Transactions on  (Volume:28 ,  Issue: 5 )