Fe-Al-Si and Fe-Al-Si-Ni magnetic films with a thickness of 1 μm were deposited on crystallized-glass substrates by RF planar magnetron sputtering, and the changes in magnetic properties and microscopic structural changes in the films due to annealing were investigated. The films annealed at 500°C exhibited excellent soft magnetic properties for recording head materials. Fe-Al-Si-Ni films with high saturation magnetic-flux densities of 14.8 kG were obtained. Conversion electron Mossbauer spectroscopy showed that the disordered structure of α-type in as-sputtered films transformed into the ordered structure consisting of a mixture of B2- and DO3-types at a temperature of 500°C
Published in:
Magnetics, IEEE Transactions on
(Volume:28
,
Issue:
5
)
Date of Publication: Sep 1992