Referenced Items are not available for this document.
A process monitoring scheme that takes advantage of real-time information in order to generate malfunction alarms is described. This is accomplished with the application of time-series filtering and multivariate statistical process control. This scheme is capable of generating alarms on a true real-time basis, while the wafer is still in the processing chamber. Several examples are presented with tool data collected from the SECSII port of single-wafer plasma etchers
Published in:
Semiconductor Manufacturing, IEEE Transactions on
(Volume:5
,
Issue:
4
)
Date of Publication: Nov 1992
- Page(s):
- 308 - 318
- ISSN :
- 0894-6507
- INSPEC Accession Number:
- 4333945
- Digital Object Identifier :
- 10.1109/66.175363
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 06 August 2002
- Issue Date :
- Nov 1992
- Sponsored by :
- IEEE Components, Packaging and Manufacturing Technology Society
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