By Topic

Fabrication of silicon strip detectors using a step-and-repeat lithography system

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
S. Holland ; Lawrence Berkeley Lab., California Univ., CA, USA

The use of a step-and-repeat lithography system (stepper) for the fabrication of silicon detectors is described. A technique was used which overcomes the field size limitation and allows fabrication of large-area strip detectors with a wafer stepper. This technique essentially consists of the precise, repetitive placement of strip patterns on the wafer. Prototype detectors using this method have been fabricated and tested. In addition to the inherent advantages of a step-and-repeat system, this technique offers great flexibility in the fabrication of large-area strip detectors since the length and width of the detector can be changed by simply reprogramming the stepper computer. The technique is presented, followed by experimental results from the first prototype

Published in:

IEEE Transactions on Nuclear Science  (Volume:39 ,  Issue: 5 )