By Topic

Anomalous Safe Operating Area and Hot Carrier Degradation of NLDMOS Devices

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
D. Brisbin ; Nat. Semicond. Corp., Santa Clara, CA ; P. Lindorfer ; P. Chaparala

Automotive and telecom applications often require voltages in the 20-30 V range. These circuits combine high-performance CMOS with a high-voltage MOS transistor. A possible choice for the high-voltage device is an n-channel lateral DMOS (NLDMOS) transistor. An advantage of an NLDMOS transistor is that it can be easily integrated within existing technologies without significant process changes. In most cases, though, the drain drift implant must be optimized to meet safe operating area (SOA) and hot carrier (HC) reliability requirements. This paper focuses on understanding anomalous SOA and HC results obtained from an NLDMOS transistor whose drain drift implant dose was varied

Published in:

IEEE Transactions on Device and Materials Reliability  (Volume:6 ,  Issue: 3 )