A Short-Channel SOI RF Power LDMOS Technology With$hboxTiSi_2$Salicide on Dual Sidewalls With Cutoff Frequency$f_T sim hbox19.3 hboxGHz$

In this letter, a CMOS-compatible silicon-on-insulator (SOI) RF laterally diffused MOS (LDMOS) technology is proposed based on TiSi
₂
salicide with SiO
₂
/Si
₃
N
₄
dual sidewalls. The use of dual sidewalls yields a large process margin for defining drift regions and preventing source-gate silicide bridging. This technology improves the cutoff frequencies and the maximum oscillation frequencies by 27%-42% and 14%-22%, respectively, for a gate length in the range of 0.5-0.25 mum. For the shortest 0.25-mum gate length, a record cutoff frequency of 19.3 GHz and a high breakdown voltage of 16.3 V are achieved simultaneously for SOI RF LDMOS. This LDMOS technology is suitable for 3.6-V-supply 0-3-GHz power RFIC applications