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A 4-kV/2-A/5-kHz Compact Modulator for Nitrogen Plasma Ion Implantation

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4 Author(s)
Rossi, J.O. ; Space Res. Nat. Inst. ; Barroso, J.J. ; Ueda, M. ; da Silva, G.

To treat stainless-steel surfaces by nitrogen plasma implantation, a solid-state compact modulator was devised, in which a 8.0-muF capacitor discharges through a forward converter composed of a low-blocking-voltage insulated-gate-bipolar-transistor switch (1.0 kV) and three step-up pulse transformers, rather than employing hard-tube devices such as in conventional plasma ion implantation pulsers, which are expensive and cumbersome. For this, a modulator was built to produce pulses with amplitudes of the order of 4 kV, duration of about 5.0 mus, and rise time of ~1.0 mus with maximum current/frequencies capabilities of 2.0 A and 5 kHz, respectively

Published in:

Plasma Science, IEEE Transactions on  (Volume:34 ,  Issue: 5 )

Date of Publication:

Oct. 2006

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