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Integration of SOI and SU-8 in a Surface-Micromachining-like Process and Its Application in Micro-Optical Systems

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5 Author(s)
Yi Chiu ; Dept. of Electr. & Control Eng., Nat. Chiao Tung Univ., Hsinchu ; Chung-Wei Wu ; Zhi-Wei Zhuang ; Jin-Chern Chiou
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This paper reports a novel fabrication process to integrate SU-8 negative resist on silicon-on-insulator (SOI) substrates. In this surface-micromachining-like process, the device layer of the SOI substrate and the SU-8 layer are two structural layers, separated by an oxide sacrificial layer. The stress-free and single-crystalline nature of the top SOI layer and the transparency of SU-8 in the visible spectrum range make this process ideal for integration of mechanical structures, optical devices, photo detectors, and circuits

Published in:

Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference on

Date of Conference:

21-24 Aug. 2006