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Modeling of anomalous frequency and bias dependences of effective gate resistance in RF CMOS

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3 Author(s)
Yan Cui ; Electr. & Comput. Eng. Dept., Alabama Microelectron. Sci. & Technol. Center, Auburn, AL ; Guofu Niu ; Taylor, S.S.

This paper explains the frequency and bias dependences of the effective gate resistance (real part of h11) by considering the effect of the gate-to-body capacitance, gate-to-source/drain overlap capacitances, fringing capacitances, and nonquasi-static (NQS) effect. A new method of separating the physical gate resistance and the NQS channel resistance is proposed. Separating the gate-to-source parasitic capacitances from the gate-to-source inversion capacitance is found to be necessary for an accurate modeling of all the Y-parameters

Published in:
Electron Devices, IEEE Transactions on  (Volume:53 ,  Issue: 10 )

Date of Publication: Oct. 2006

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