By Topic

Control chart techniques for high volume, multiple process wafer fabrication areas

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Bassett, T., III ; Signetics Corp., Sunnyvale, CA, USA

Control chart format and response to out-of-control conditions are examined. The main emphasis is on control charting pragmatism, simplicity, and cost effectiveness. Although several basic statistical tools are referenced, the control chart as a `current time, operation driven, historically succinct, online process control tool', is the main focus. Control chart data log consolidation, z-normalization, fat targeting, sensor numbers, and symbolism are reviewed, with actual examples from the fabrication area to demonstrate design and modification of these simple, inexpensive, and powerfully effective statistical tools. Examples come from the traditional process parametrics, contamination control, product/inventory flow, and online statistical maintenance control applications

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1991. ASMC 91 Proceedings. IEEE/SEMI 1991

Date of Conference:

21-23 Oct 1991