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Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching

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3 Author(s)
Abe, T. ; Member; Graduate School of Engineering, Tohoku University, Aramaki, Aoba-ku, Sendai 980-8579, Japan ; Hung, V.N. ; Esashi, M.

In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.

Published in:

Ultrasonics, Ferroelectrics and Frequency Control, IEEE Transactions on  (Volume:53 ,  Issue: 7 )

Date of Publication:

July 2006

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