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Micromachined chromium nitride thin-film pressure sensor for high temperature applications

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1 Author(s)
Chung, G.S. ; Sch. of Electr. Eng., Univ. of Ulsan, Namgu, South Korea

The fabrication and characteristics of a micromachined chromium nitride (Cr-N) thin-film pressure sensor with high overpressure tolerance for high temperature applications are presented. The proposed pressure sensor consists of a Cr-N thin-film, patterned after a Wheatstone bridge configuration, and then sputter-deposited onto thermally oxidised Si membranes with a buried cavity for overpressure tolerance and an Al interconnection layer. This device is very suitable for high temperature integrated pressure sensors.

Published in:

Electronics Letters  (Volume:42 ,  Issue: 13 )