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Point-of-Use Ultra-Pure Water for Immersion Lithography

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4 Author(s)
M. E. Clarke ; Entegris, Inc., Billerica, MA ; A. Xia ; J. Smith ; B. Parekh

In this paper we describe the design and development of point-of-use UPW (ultra pure water) components and systems for the immersion application. The paper addresses the water quality needs for the immersion lithography process and presents key contaminant removal techniques and performance results. POU water delivery systems are designed based upon individual customer needs

Published in:

The 17th Annual SEMI/IEEE ASMC 2006 Conference

Date of Conference:

22-24 May 2006