Referenced Items are not available for this document.
In this paper, a novel nanofabrication method that develops from the traditional microelectromechanical system (MEMS) technology of anisotropic etching, deep reaction ion etching, and sacrificial layer process has been reviewed based on our work. With such a technology, nano tips, nano wires, nano beams even nano devices can be fabricated in a batch process. Beams with thickness of only 12 nm, a nano tip with a heater on the beam, and a nano wire whose width and thickness is only 50 nm are demonstrated. The scale effect of the Young's modulus of silicon has been observed and the nano-electronic-mechanical data storage has been presented
Published in:
Sensors Journal, IEEE
(Volume:6
,
Issue:
3
)
Date of Publication: June 2006
- Page(s):
- 686 - 690
- ISSN :
- 1530-437X
- INSPEC Accession Number:
- 8949403
- Digital Object Identifier :
- 10.1109/JSEN.2006.874034
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 05 June 2006
- Issue Date :
- June 2006
- Sponsored by :
- IEEE Sensors Council
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