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Drastic reduction of chemical consumption in wet cleaning process for semiconductor manufacturing by using functional water

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2 Author(s)
H. Kurobe ; Kurita Water Industries Ltd., Shinjuku-ku, Tokyo 160-8383, Japan, E-mail address: ; H. Morita

In cleaning processes of semiconductor manufacturing, a method called `RCA cleaning' is used for a long time. We suggest `functional water cleaning' as the first substituted method of RCA cleaning. Functional water for wet cleaning is water that specific gases are dissolved in, mainly hydrogenated water (H2-water) and ozonated water (O3-water). In this paper, we introduce cleaning effect, impact for cost reduction and ESH (Environment, Safety, Health) protection by using functional water.

Published in:

2005 4th International Symposium on Environmentally Conscious Design and Inverse Manufacturing

Date of Conference:

12-14 Dec. 2005