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Non-contacting deformation of isolated resist pattern due to interaction force analyzed by atomic force microscope

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3 Author(s)
Kawai, Akira ; Dept. of Electr. Eng., Nagaoka Univ. of Technol., Japan ; Niiyama, T. ; Moriuchi, T.

In this paper, we focus on slight deformation of resist pattern due to an interaction force between a tip and a pattern in non-contacting stage. In the force measurement, the AFM tip approaches slowly to the resist pattern from the resting position at which no interaction force acts on the tip. Then, the cantilever begins to bend toward resist surface due to interaction force. This phenomenon can be analyzed by an equivalent spring model. These interaction results enable to discuss the possibility of the resist pattern deformation without any contact force for the future devices.

Published in:

Microprocesses and Nanotechnology Conference, 2005 International

Date of Conference:

25-28 Oct. 2005