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Dependence of acid yield on resist thickness in chemically amplified electron beam resist

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5 Author(s)
Shigaki, T. ; Inst. of Sci. & Ind. Res., Osaka Univ., Japan ; Okamoto, K. ; Kozawa, T. ; Yamamoto, H.
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In this work, we quantified acid density generated in chemically amplified EB resists. The dependence of acid yield on resist thickness was made clear. The average density of acids nonlinearly increased with resist thickness. Although the accumulated energy is a good indicator, we have to consider how energy is consumed to generate acids for the accurate prediction of acid yields.

Published in:

Microprocesses and Nanotechnology Conference, 2005 International

Date of Conference:

25-28 Oct. 2005