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Extremely thin, single-crystal films of LiNbO3 fabricated using localized He+ ion-implantation

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6 Author(s)
Djukic, D. ; Microelectron. Sci. Lab., Columbia Univ., New York, NY, USA ; Izuhara, T. ; Roth, R.M. ; Osgood, R.M., Jr.
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We demonstrate that extremely thin, i.e., ∼2-3μm, single-crystal films of LiNbO3 can be formed on a wafer using patterned ion-implantation followed by chemical etching. Control of the membrane thickness and its waveguiding properties are demonstrated.

Published in:

Lasers and Electro-Optics, 2005. (CLEO). Conference on  (Volume:1 )

Date of Conference:

22-27 May 2005