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IC layout verification method, which considers mismatches between results of lithographical modeling and a real image

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4 Author(s)
Koukharenko, S.N. ; Belarusian State Univ. of Informatics & Radioelectron., Minsk ; Volk, S.V. ; Zayats, A.M. ; Smimov, A.G.

This paper describes a method of IC layout verification on manufacturability. The method considers matches between results of lithography modeling and a image on a wafer obtained after manufacturing

Published in:
Microwave & Telecommunication Technology, 2005 15th International Crimean Conference  (Volume:2 )

Date of Conference: 16-16 Sept. 2005

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