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Highly tunable photonic band gap in inverse shell non-close-packed structures

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4 Author(s)
Gaillot, D.P. ; Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA ; Graugnard, E.D. ; King, Jeffrey S. ; Summers, Christopher J.

Using 3D-FDTD computations, photonic band gap properties of materials which can be fabricated by an innovative atomic layer deposition (ALD) technique was presented. Non-sintered synthetic opal was conformally infiltrated with a buffer material that can be selectively etched, and a high refractive index material subsequently infiltrated onto the buffer layer up to the maximum infiltration of 86%. After complete chemical removal of the dielectric spheres and sacrificial layer, the inverse structure can be backfilled so that a high refractive index material conforms to the interior geometry of the remaining backbone

Published in:

Lasers and Electro-Optics Society, 2005. LEOS 2005. The 18th Annual Meeting of the IEEE

Date of Conference:

22-22 Oct. 2005