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Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography

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5 Author(s)
Roelkens, G. ; Dept. of Inf. Technol., Ghent Univ., Gent, Belgium ; Dumon, P. ; Bogaerts, W. ; Van Thourhout, D.
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We present a silicon-on-insulator (SOI) waveguide to fiber coupler fabricated using 248-nm-deep ultraviolet lithography. The loss of the taper structure is around 1 dB while the coupling loss from a lensed fiber into a 590-nm-wide SOI waveguide was measured to be 1.9 dB.

Published in:

Photonics Technology Letters, IEEE  (Volume:17 ,  Issue: 12 )