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Fabrication of L10-FePt thin films by rapid thermal annealing

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4 Author(s)
Aimuta, K. ; Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Aichi, Japan ; Nishimura, K. ; Hashi, S. ; Inoue, M.

Fabrication of L10-FePt thin films by using conventional thermal annealing and indirect rapid thermal annealing is studied. By using conventional thermal annealing, L10-FePt thin films are fabricated over 500°C. By using the rapid thermal annealing, it was found that the formation temperature of L10-FePt thin films decreases effectively. In addition, this method enables to prevent the grain growth due to annealing.

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Magnetics, IEEE Transactions on  (Volume:41 ,  Issue: 10 )