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Plasma charging damage - where do we stand?

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1 Author(s)
Cheung, K.P. ; Electr. & Comput. Eng., Rutgers Univ., New Brunswick, NJ, USA

A few years ago, plasma charging damage was a serious yield and reliability problem in the silicon integrated circuit (IC) industry. Recently, its importance appears to diminish as technology continues to advance. In this paper, we take a closer look at this trend and discuss the reason behind it. Clearly, the opportunity to introduce plasma charging damage is increasing as technology evolves.

Published in:

Integrated Circuit Design and Technology, 2005. ICICDT 2005. 2005 International Conference on

Date of Conference:

9-11 May 2005