By Topic

Novel fabrication of glass microchip using amorphous silicon for comparison of channel surface properties on electrophoresis

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Min-Su Kim ; Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea ; Seung Il Cho ; Kook-Nyung Lee ; Yong-Kweon Kim

We describe a new fabrication method for a glass microchip using amorphous silicon on the glass surface as an etch mask and a bonding interface for anodic bonding. We investigated the mobilities and bandwidths of electroosmotic flow (EOF) and analytes in microchip electrophoresis. Significant band broadening was observed in a microchip composed of a hybrid material (glass and silicon dioxide membrane) compared with a microchip of single material due to the nonuniformity of the surface charge density.

Published in:

Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on  (Volume:2 )

Date of Conference:

5-9 June 2005