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Novel fabrication of glass microchip using amorphous silicon for comparison of channel surface properties on electrophoresis

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4 Author(s)
Min-Su Kim ; Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea ; Seung Il Cho ; Kook-Nyung Lee ; Yong-Kweon Kim

We describe a new fabrication method for a glass microchip using amorphous silicon on the glass surface as an etch mask and a bonding interface for anodic bonding. We investigated the mobilities and bandwidths of electroosmotic flow (EOF) and analytes in microchip electrophoresis. Significant band broadening was observed in a microchip composed of a hybrid material (glass and silicon dioxide membrane) compared with a microchip of single material due to the nonuniformity of the surface charge density.

Published in:
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on  (Volume:2 )

Date of Conference: 5-9 June 2005

Page(s):
1612 - 1615 Vol. 2
Print ISBN:
0-7803-8994-8
INSPEC Accession Number:
8660007
Digital Object Identifier :
10.1109/SENSOR.2005.1497396
Product Type:
Conference Publications

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