Skip to Main Content
In this work lithographic techniques, combined with sputtering depositions, are employed to fabricate semiconductor metal-oxide (MOX) gas sensors with controlled grain dimensions. The basic idea is to replace the continuous sensing film of standard MOX sensors with a pattern of wires in the submicron scale, thus providing a maximum lateral size for the grains. The electrical responses to several gases are tested and compared with the responses of continuous film sensors. The experimental data highlight an improvement for the patterned sensors.